ACM Research, Inc., a leading supplier of wafer and panel processing solutions for semiconductor and advanced packaging applications, has recently announced the launch of its groundbreaking Ultra Lith KrF track system. This new system is designed to deliver high-throughput performance with a proprietary platform design, driving advanced process control for mature-node lithography applications.
The Ultra Lith KrF track system, which was shipped to a leading Chinese logic wafer fab customer in September 2025, builds on the success of ACM’s ArF track platform. The ArF track platform completed demo-line process verification with a leading Chinese customer in late 2024, showcasing sub-angstrom-level coating uniformity, advanced thermal control, and ASML scanner-aligned CD matching. These capabilities served as the foundation for the design optimization of the KrF platform.
Dr. David Wang, President and Chief Executive Officer of ACM, expressed the company’s commitment to addressing a broader range of lithography challenges with the launch of the Ultra Lith KrF track system. He emphasized the importance of KrF lithography for mature-node devices and highlighted the system’s ability to seamlessly integrate with ACM’s existing ArF track systems, offering greater manufacturing flexibility across diverse applications.
The Ultra Lith KrF track system features a flexible process module configuration with 12 spin coaters and 12 developers, supported by 54 hot plates capable of low, mid, and high-temperature processing with industry-leading thermal uniformity. The system boasts a throughput of over 300 wafers per hour (WPH) and incorporates ACM’s proprietary backside particle removal unit (BPRV) technology to minimize cross-contamination risk. Additionally, the integrated wafer-scale outlier inspection (WSOI) unit enables real-time process variation detection and yield anomaly monitoring, enhancing process stability and production efficiency.
In conclusion, ACM’s Ultra Lith KrF track system represents a significant advancement in front-end semiconductor manufacturing technology. With its high-throughput performance, advanced thermal control, and real-time process monitoring capabilities, this system is poised to drive innovation and efficiency in the semiconductor industry. For more information about ACM Research, Inc. and its cutting-edge semiconductor process equipment, visit their website at http://www.acmr.com.